![PDF) Some aspects on mechanisms responsible for contamination of optical components in DUV lithographic exposure tools | Hans Fosshaug - Academia.edu PDF) Some aspects on mechanisms responsible for contamination of optical components in DUV lithographic exposure tools | Hans Fosshaug - Academia.edu](https://0.academia-photos.com/attachment_thumbnails/48622952/mini_magick20190203-26800-1qmw6z7.png?1549187381)
PDF) Some aspects on mechanisms responsible for contamination of optical components in DUV lithographic exposure tools | Hans Fosshaug - Academia.edu
![PDF) Reducing process contributions to CD error range using the Sigma7500 pattern generator and ProcessEqualizer (TM) - art. no. 62831I PDF) Reducing process contributions to CD error range using the Sigma7500 pattern generator and ProcessEqualizer (TM) - art. no. 62831I](https://i1.rgstatic.net/publication/253461496_Reducing_process_contributions_to_CD_error_range_using_the_Sigma7500_pattern_generator_and_ProcessEqualizer_TM_-_art_no_62831I/links/5458b1a70cf2bccc4911e709/largepreview.png)
PDF) Reducing process contributions to CD error range using the Sigma7500 pattern generator and ProcessEqualizer (TM) - art. no. 62831I
![PDF) Influence of writing strategy on CD control for the spatial-light-modulator-based Sigma7300 DUV laser pattern generator PDF) Influence of writing strategy on CD control for the spatial-light-modulator-based Sigma7300 DUV laser pattern generator](https://i1.rgstatic.net/publication/241202232_Influence_of_writing_strategy_on_CD_control_for_the_spatial-light-modulator-based_Sigma7300_DUV_laser_pattern_generator/links/54589e2a0cf26d5090ab9872/largepreview.png)
PDF) Influence of writing strategy on CD control for the spatial-light-modulator-based Sigma7300 DUV laser pattern generator
![PDF) Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer | Hans Fosshaug - Academia.edu PDF) Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer | Hans Fosshaug - Academia.edu](https://0.academia-photos.com/attachment_thumbnails/48622947/mini_magick20190203-10052-1ii43f4.png?1549187419)
PDF) Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer | Hans Fosshaug - Academia.edu
![A schematic of Sigma7500 SLM pattern generation. (Courtesy of Micronic... | Download Scientific Diagram A schematic of Sigma7500 SLM pattern generation. (Courtesy of Micronic... | Download Scientific Diagram](https://www.researchgate.net/profile/Chiang-Lin-Shih/publication/252557126/figure/fig1/AS:375710440017922@1466587757197/A-schematic-of-Sigma7500-SLM-pattern-generation-Courtesy-of-Micronic-Laser-System-AB_Q640.jpg)